Plasma generation apparatus

ABSTRACT

A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, including: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.

CROSS-REFERENCE TO RELATED PATENT APPLICATIONS

This application claims the benefit of Korean Patent Application No.2005-13187, filed on Feb. 17, 2005, in the Korean Intellectual PropertyOffice, the disclosure of which is incorporated herein in its entiretyby reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to an apparatus for etching and depositinga wafer or a glass using a plasma source, more particularly, to a plasmageneration apparatus generating plasma using an induction electric fieldinduced a time-varying magnetic field of a toroidal core.

2. Description of the Related Art

Generally, the plasma generation apparatus using the plasma sourceincludes a plasma enhanced chemical vapor deposition (PECVD) apparatusfor a thin film deposition, a reactive ion etching (RIE) apparatusetching a deposited thin film, sputter and ashing or the like.

In addition, the plasma generation apparatus is classified with acapacitive coupled plasma (CCP) apparatus and an inductive coupledplasma (ICP) apparatus in accordance with an applying type of a radiofrequency (RF) power. At this time, the former generates plasma using aRF electric field vertically formed between electrodes by applying theRF power to planar electrodes facing each other, and the latter changesa source material into plasma using the induction electric field inducedby a RF antenna.

Among them, the CCP type is more utilized than the ICP type. However,since ion energy of the CCP type is relatively high, defect possibilitythereof is high regarding parts of a substrate or an inner of theapparatus due to an ion bombardment. Further, there is a problem notcapable of using it in a low-pressure region less than a few mTorr aswell as a difficulty that a line width or a selection ratio should becontrolled.

Whereas the ICP type is effectively able to generate plasma in thelow-pressure region in comparison with the CCP type. Further, the ICPtype has an advantage capable of obtaining plasma having a much higherdensity than the CCP type. In addition, in the ICP type, the RF power isindependently applied to the substrate different from the CCP type thatthe substrate is loaded on a susceptor functioning as an electrode.Accordingly, there is an advantage that the ion energy entered thesubstrate can be independently controlled.

FIG. 1 is a schematic cross-sectional view showing an ICP type plasmageneration apparatus according to the related art.

As shown in FIG. 1, an ICP type plasma generation apparatus includes achamber 11 having a chamber lid 11 a and defining an airtight reactionregion (not shown), a susceptor 12 in the chamber 11 and having asubstrate “s,” a shower head 13 spraying a source material on a topsurface of the susceptor 12, and a gas intake pipe 14 flowing the sourcematerial in the shower head 13.

Further, a RF antenna 15 supplying a RF power to the chamber 11 isdisposed over the chamber lid 11 a in order to change the sourcematerial into plasma. A RF power supply 17 is connected to the RFantenna 15.

A matching circuit 16 between the RF antenna 15 and the RF power supply17 plays a role of matching load impedance and source impedance in orderto apply a maximum power to the RF antenna 15.

At this time, when the RF power supply 17 is applied to the RF antenna15, a time-varying magnetic field having a vertical direction occurs andan electric field is induced by the time-varying magnetic field in thechamber 11, wherein an accelerated electron collides with anelectrically neutral ionized gas by the induction electric field.Therefore, a radical having a strong oxidation power is generated andthe electron and the radical are changed into a mixture gas of a plasmastate, so the radical is entered the substrate “s” and a process such asdepositing and etching or the like is performed.

At this time, a different bias power (not shown) from the RF powersupply 17 may be applied to the susceptor 12 in order to control anincident energy of the radical entered the substrate “s.”

Meanwhile, the susceptor 12 further includes a heater (not shown)therein for pre-heating the substrate “s” and an exhaust 18 under thechamber 11 exhausts a residual gas, for example, through a vacuum pump.

Hereinafter, FIG. 2 is a schematic cross-sectional view showing a coiltype antenna according to the related art.

As shown in FIG. 2, a RF antenna 15 consists of a plurality of antennacoils 15 a, 15 b and 15 c, wherein each of the antenna coils 15 a, 15 band 15 c is disposed over the chamber lid 11 a and is connected to theRF power supply 17 via a matching circuit 16 by a RF cable 19.

Accordingly, when the RF power supply 17 is applied to the chamber 11,the time-varying magnetic field, which is orthogonal in each of theantenna coils 15 a, 15 b and 15 c is generated and an electric field isinduced in surrounding of the time-varying magnetic field.

However, among the induction electric field generated by thetime-varying magnetic field, an induction electric field, which issuffered a loss, exists in a top portion of the chamber 11 besides theinduction electric field utilized for generating plasma in the chamber11. Further, it becomes had a structure that a leakage flux is generateda lot without a specific magnetic field shielding means. Accordingly, ahigh voltage RF power should be supplied to the chamber 11 to obtain apredetermined induction electric field for plasma generation andmaintenance, as a result, a pollution source may occur in an inner wallof the chamber due to thermalization of the sputtering and parts by thehigh energy ion, and a loss of the RF power is undesirably increased.

To solve the problems, a method forming an induction electric fieldusing a toroidal antenna 20 is suggested as shown in FIG. 3.

FIG. 3 is a schematic cross-sectional view showing a toroidal antennaaccording to the related art.

As shown in FIG. 3, a RF power is applied to the chamber 110 (of FIG. 1)by rolling a induction coil 11 surround of the toroid antenna 20 of aferromagnetic such as a ferrite, most of flux of a time-varying magneticfield generated by the RF current flowing the induction coil 22 areinduced along an inside of the toroid antenna 20. Therefore, much biggerflux density can be obtained than that of the related art using the coiltype RF antenna 15. Accordingly, since the electric field intensity,which is induced in an opening portion 21 of the toroid antenna 20 canbe significantly increased, finally, dissociation and ionization rate ofthe source material can be increased and a high-density plasma can beeasily obtained.

That is, the present invention relates to the plasma generationapparatus generating plasma using the toroidal antenna 20, moreparticularly, the plasma generation apparatus according to the presentinvention is suggested so as to easily generate a high-density plasmaunder a low temperature and a low pressure in order to be applied to ahigh-integrated circuit pattern.

Recently, necessity regarding plasma for low temperature deposition isgradually increased centering around a manufacturing process such as alow temperature polysilicon (LTPS), an electron luminescence (EL) and acarbon nano tube (CNT) or the like. However, the plasma for the lowtemperature deposition demanded in this process, should have a plasmadensity more than about 2×10¹¹/cm³ and an electron energy more thanabout 4 eV. Generally, the more the electron energy is high, the more afilm quality is good.

Further, the more a process pressure is low, the more the film qualityis good. Therefore, if possible, the plasma should be effectively burnedand maintained under the process pressure less than about 5 mTorr. Inaddition, properly, the ion energy and the plasma electric potentialshould be low to prevent a substrate defect due to the ion bombardment.

For example, although the LTPS process according to the related art isperformed a crystallization method such that crystallization ofpolysilicon without rise of the substrate temperature by a laserirradiation after depositing an amorphous silicon using a CCP type,there is an advantage capable of directly depositing the polysilicon onthe substrate without the crystallization process upon using the plasmafor the low temperature deposition.

Further, in case of an organic electro luminescent device such that ananode, a hole transport layer, a organic luminescent layer, an electrontransport layer and a cathode are sequentially formed therein, whereinthe hole transport layer, the organic luminescent layer, and theelectron transport layer are generally made of an organic material.Here, since the organic material consists of monomer material, it isweak against moisture or a high energy. Accordingly, to solve theproblem, although a process including filling a raw material in amelting pot, vaporizing the raw material and depositing the vaporizedraw material on the substrate is suggested, but it is difficult thatthis process is applied to a large size substrate and a deposition speedis also slow.

Recently, the plasma generation apparatus using the toroidal antenna issuggested as an external model that the toroidal antenna is disposed ona plasma generation chamber additionally formed on the chamber and aninternal type that the toroidal antenna is completely formed within thechamber without being exposed outside the chamber. Among them, in theexternal type plasma generation apparatus, since the plasma generationchamber is quite spaced apart from the main chamber, it is difficultthat a high plasma density at a position corresponding to the substrate.In addition, since an eddy current occurs in a sidewall of the plasmageneration chamber covering the external toroidal antenna and theinduction electric field has a high rate defected by the sidewall of theplasma generation chamber, it is inevitable that energy transmissionefficiency is low. Consequently, there is a disadvantage consideringplasma burning and maintenance.

Meanwhile, in the internal type toroidal antenna, since an inductioncoil rolling the toroidal antenna is disposed with the chamber as wellas the toroidal antenna, plasma impedance effects impedance of theinduction coil connected to the RF power. As a result, matchingcondition of the RF power becomes unstable and a vacuum seal should bedemanded to protect the induction coil or the RF power supply line fromplasma. Particularly, when an exothermic temperature of the toroidalantenna is more than a Curie temperature, a ferromagnetic substance ischanged into a paramagnetic substance. Therefore, the time-varyingmagnetic field does not occur in the chamber.

In addition, since magnetic permeability is changed or power loss isincreased due to exothermal, it is important to appropriately cool thetoroidal antenna. However, since the toroidal antenna is disposed withinthe chamber in case of the internal type, it is not easy to cool thetoroidal antenna.

SUMMARY OF THE INVENTION

Accordingly, the present invention is directed to a plasma generationapparatus having a toroidal core that substantially obviates one or moreof problems due to limitations and disadvantages of the related art.

An object of the present invention is to provide a plasma generationapparatus that can easily generate plasma having a high density, highelectron energy, a low pressure, low ion energy, and a low plasmaelectric potential.

An advantage of the present invention is to provide a toroidal antennathat can maximumly utilize a core property of a ferromagnetic substanceas a toroid because it is possible the toroidal antenna simply andeffectively to be cool and can solve problems that the induction coilrolling the toroidal antenna or the power supply line should bevacuum-sealed.

An advantage of the present invention is to provide a plasma generationapparatus that can easily widening a generating size of plasma byconnecting at least two toroidal antenna modules.

Additional features and advantages of the invention will be set forth inthe description which follows, and in part will be apparent from thedescription, or may be learned by practice of the invention. Theobjectives and other advantages of the invention will be realized andattained by the structure particularly pointed out in the writtendescription and claims hereof as well as the appended drawings.

To achieve these and other advantages and in accordance with the purposeof the present invention, as embodied and broadly described, a plasmageneration apparatus includes: a chamber having a chamber lid anddefining an airtight reaction region; a susceptor in the chamber; a gassupply means supplying a process gas to the chamber; and a toroidal corevertically disposed with respect to the susceptor through the chamberlid, comprising: a toroidal ferromagnetic core combined with thechamber, the toroidal ferromagnetic core having a first portion outsidethe chamber and a second portion inside the chamber, the second portionhaving an opening portion; a radio frequency (RF) power supply connectedto the chamber; an induction coil electrically connected to the RF powersupply, the induction coil rolling the first portion; and a matchingcircuit matching an impedance between the RF power supply and theinduction coil.

In another aspect, a plasma generation apparatus includes: a chamberhaving a chamber lid and defining an airtight reaction region; asusceptor in the chamber; a gas supply means supplying a process gas tothe chamber; and a toroidal core module including a toroidal corevertically disposed with respect to the substrate through the chamberlid, the toroidal core combined with the chamber, the toroidal corehaving a first portion outside the chamber and a second portion insidethe chamber, the second portion having an opening portion, comprising; apower supply unit generating a radio frequency (RF) power by beconnected to an external power supply; an induction coil electricallyconnected to the power supply unit, the induction coil rolling thetoroidal core; a matching circuit matching an impedance between thepower supply unit and the induction coil; and a housing surrounding thetoroidal core, the power supply unit, the induction coil and thematching circuit.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWING

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification, illustrate embodiments of the invention andtogether with the description serve to explain the principles of theinvention.

In the drawings:

FIG. 1 is a schematic cross-sectional view showing an ICP type plasmageneration apparatus according to the related art;

FIG. 2 is a schematic cross-sectional view showing a coil type antennaaccording to the related art;

FIG. 3 is a schematic cross-sectional view showing a toroidal antennaaccording to the related art;

FIG. 4 is a schematic cross-sectional view showing a plasma generationapparatus according to an embodiment of the present invention;

FIG. 5 is a schematic perspective view showing a toroidal antennaaccording to an embodiment of the present invention;

FIG. 6 is a schematic cross-sectional view showing a plasma generationapparatus according to an embodiment of the present invention;

FIG. 7 is a schematic perspective view showing a toroidal core moduleaccording to an embodiment of the present invention;

FIGS. 8A and 8B are schematic cross-sectional views showing plasmageneration apparatuses according to embodiments of the presentinvention, respectively;

FIG. 9 is a schematic cross-sectional view showing a plasma generationapparatus having two toroidal core modules according to anotherembodiment of the present invention.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

Reference will now be made in detail to the illustrated embodiments ofthe present invention, which are illustrated in the accompanyingdrawings.

FIG. 4 is a schematic cross-sectional view showing a plasma generationapparatus according to an embodiment of the present invention.

As shown in FIG. 4, a plasma generation apparatus 100 includes a chamber110 defining an airtight reaction region and having a chamber lid 110 a,a susceptor 120 in the chamber 110, and an exhaust 114 exhausting aresidual gas toward bottom of the chamber 11.

It is noted that the plasma generation apparatus 100 includes a toroidalantenna 130 as a plasma source. Specifically, the toroidal antenna 130is vertically combined with the chamber lid 110 a, wherein the toroidalantenna 130 includes a first portion outside the chamber 110 and asecond portion inside the chamber 110, and wherein the second portionhas an opening portion 130 a. At this time, the plasma generationapparatus 100 further includes an induction coil 134 rolling the firstportion of the toroidal antenna 130 and a cover 131 covering thetoroidal antenna 150 to protect it.

However, the toroidal antenna 130 may be combined with a lateral walland a bottom portion of the chamber 110 in accordance with the kind ofthe apparatus as well as the mentioned position thereof. In addition,the number of the toroidal antenna 130 is particularly not limited.

Although the opening portion 130 a of the toroidal antenna 130 isillustrated so as to show for a convenience sake, substantially, theopening portion 130 a in each the toroidal antenna 130 may be disposedso as to face each other by rotating with 90° the toroidal antenna 130for generating induction electric field with a parallel direction.However, the facing angle of the opening portion 130 a may be controlledin accordance with property of process or apparatus.

Meanwhile, the induction coil 134 is connected to a RF power supply 140supplying a RF power to the chamber 110. A matching circuit 150, whichmatches load impedance and source impedance, is disposed between the RFpower and each induction coil 134. Although the RF power is supplied toeach toroidal core 132 through one RF power supply 140 and one matchingcircuit 150 as shown in FIG. 4, it may connect another RF power supplyand another matching circuit in each toroidal core 132 as followinganother embodiment. The RF power supply 140 according to the embodimentof the present invention supplies the RF power having a range withinabout 10 KHz to about 13.56 MHz.

Since the toroidal core 132 provides a route passing a magnetic fieldgenerated by the RF current flowing the induction coil 134 rolling thetoroidal core 132, the toroidal core 132 may include one of a ferritematerial and an iron powder material.

It is noted that the toroidal core 132 should have the opening portion130 a in which electric flux of the induction electric field passes inthe central portion thereof. In other words, the shape of the toroidalcore 132 is not limited as a “D”-like shape as shown in FIG. 5 when thetoroidal core 132 is satisfied with the mentioned condition.

However, at least a portion of the opening portion 130 a should bedisposed in the chamber 110 to raise the plasma density by increasingenergy transmission efficiency from the induction electric fieldgenerated by the toroidal core 132. In addition, if the portion of thetoroidal core within the chamber 110 is directly exposed from plasma, itbecomes a generation source of particles. Therefore, properly, theportion of the toroidal core 132 is covered with a cover 131.Specifically, the cover 131 includes one of ceramic, aluminum andstainless steel. Here, a nonconducting substance such as ceramic may bepartially utilized for the cover 131 so as to block an eddy current thatmay be induced in metals such as aluminum and stainless steel.

The toroidal core 132 is combined with the chamber lid 110 a and iscovered with the cover 131. Further, an O-ring 112 is formed between thecover 131 and the chamber lid 110 a for vacuum seal. When a spacebetween the lateral wall of the cover 131 and the toroidal core 132 isutilized for a refrigerant flow route 133 by being spaced apart fromeach other, a heat generated from the toroidal core 132 is effectivelycooled. Accordingly, a refrigerant inlet 136 and a refrigerant outlet137 are formed in a position that a portion of the cover 131 disposed attop of the chamber lid 110 a. In addition, a refrigerant intake pipe 138and a refrigerant outtake pipe 139 connected to an external coolingsystem may be connected to the portion of the cover 131. At this time,since top space of the chamber lid 110 a exists under an atmosphericpressure, it is easy to use air as a refrigerant but it is not limited.

FIG. 5 is a schematic perspective view showing a toroidal antennaaccording to an embodiment of the present invention.

As shown in FIG. 5, in a toroidal antenna 130, a refrigerant intake pipe138 and a refrigerant outtake pipe 139 are connected to a straight-lineportion having a “D”-like shape thereof. Since inner spaces of thechamber are divided with atmospheric state and with vacuum state by thecover, it is natural that the cover 131 should be vacuum-sealed.

Further, the plasma generation apparatus 100 includes a feedback controlunit 160 controlling a RF power supply 140 or a matching circuit 150measuring a plasma condition in the chamber 110. Here, the feedbackcontrol unit 160 may be formed a portion of the control computeroperated by an operator or may be formed another portion thereof.

Information of the plasma condition is detected through a plasmainspecting unit 180, wherein the detecting method may include a staticprobe type using a probe pole 182 as shown in FIG. 5 and aphotodiagnosis type through a viewer port. The measured information ofplasma parameter is utilized as a data controlling the RF powerintensity or phase or a direction of each toroidal core 132 supplied toeach toroidal core 132 from the feedback control unit 160.

Furthermore, a power supply line 135 between each toroidal core 132 andthe matching circuit 150 includes a voltage-current (V-I) inspectingunit 170 where voltage and current of the RF power are checked for anaccurate control of the RF power. Properly, additional phase shiftcircuit (not shown) is connected to the power supply line 135 connectedto each toroidal core 132 to control phase of the RF power supply 140,and the phase shift circuit is controlled by the feedback control unit160.

In addition, the plasma generation apparatus 100 includes a rotationdriving unit 190 driving by the feedback control unit 160 and connectedto each toroidal core 132, wherein the rotation driving unit 190 isdriven by a driving motor and a predetermined gear combined with thedriving motor. Here, the toroidal core 132 is rotated along a thetadirection, that is, a vertical axis with respect to the substrate by therotation driving unit 190.

When the toroidal core 132 is rotated, simultaneously, the cover 131covering the toroidal core 132 is rotated. Accordingly, to rotate thecover 131 maintaining the vacuum seal at a boundary between the cover131 and the chamber 110, a magnetic seal, which is made of a magneticfluid, may be utilized. Although not shown regarding a means flowinginto a process gas in the chamber 110, the means may be selected from aninjector or a shower head over the susceptor 120. Alternatively, themeans may correspond to a spray means spraying the process gas toward acenter from edges of the susceptor 120.

Hereinafter, it will be explained about a process flow regarding thementioned plasma generation apparatus 100 referring to FIG. 4.

First of all, when the substrate “s” is loaded on the susceptor 120through a door (not shown), the time-varying magnetic field is generatedin the toroidal core 132 by applying the RF power supply 140 to theinduction coil 134 and by simultaneously spraying the process gas in thechamber 110 from outside of the chamber 110 after controlling a processpressure through the vacuum pumping.

Next, the induction electric field, which passes the opening portion 130a of the toroidal core 132, is generated by the time-varying magneticfield. At this time, since the toroidal core 132 is vertically disposedwith respect to the susceptor 120, the induction electric field isparallel to the susceptor 120.

In addition, plasma, or mixture gas of a radical and an electron, isgenerated by dissociation and ionization of the process gas due to theinduction electric field, the radical enters the substrate “s” andprocesses such as deposition and etching are performed. At this time,when the toroidal core 120 is prepared as a plurality of toroidal cores120, the induction electric field having a much parallel and wide regionwith respect to the susceptor 120 can be formed, thereby generatingplasma for a large size substrate.

FIG. 6 is a schematic cross-sectional view showing a plasma generationapparatus according to an embodiment of the present invention.

As shown in FIG. 6, it is noted that a plurality of RF power supplies140 are connected to a plurality of toroidal core 132, respectively.

The plasma generation apparatus 100 further includes a phase shifter 200that controls a phase of each RF power supply 140, wherein the phaseshifter 200 is automatically controlled by the feedback control unit160. Therefore, the plasma parameter and uniformity thereof can beaccurately controlled in the chamber 110 based on the plasma parameterobtained through the plasma inspecting unit 180 as well as the RF powercontrol, a direction control of the toroidal core 132 of each inductioncoil 134. As explained above, the plasma generation apparatus 100 usingplasma according to the present invention includes the toroidal core 132directly combined with the chamber lid 110 a, further, the RF powersupply 140, the matching circuit 150 or the like are connected to eachtoroidal core 132.

Hereinafter, another embodiment according to the present inventionsuggests a plasma generation apparatus including a toroidal coremanufactured as a module having the power supply unit and the matchingcircuit. That is, a toroidal core module capable of combining to thechamber by a module unit is explained as follows.

FIG. 7 is a schematic perspective view showing a toroidal core moduleaccording to an embodiment of the present invention. FIGS. 8A and 8B areschematic cross-sectional views showing plasma generation apparatusesaccording to embodiments of the present invention, respectively.

As shown in FIGS. 7, 8 a and 8 b, a toroidal core 132 is combined withan edge of a housing 310 of a can type. It is noted that the housing 310surrounds a power supply unit 140 a, a matching circuit 150, a V-I probeunit 170 and a rotation driving unit 190.

Particularly, the induction coil 134, which is connected to the powersupply unit 140 a, is disposed within the housing 310, the toroidal core132 is projected outside the housing 310 and the induction electricfield combined with the opening portion 130 a is directly related toplasma generation, thereby raising energy transmission efficiency andplasma density.

Meanwhile, the toroidal core 132 is isolated from an outside of thechamber 110 by the cover 131, and an O-ring 320 is formed for vacuumseal at a boundary between the housing 310 and the cover 131. Here, theO-ring 320 may include a magnetic seal using a magnetic fluid in orderto rotate the toroidal core 132 by the rotation driving unit 190 in thehousing 310. The rotation driving unit 190 rotate the toroidal core 132with respect to theta axis using a motor and a gear or the like, at thistime, the central axis of the opening portion 130 a is orthogonal withthe theta axis.

Meanwhile, the housing 310 can be rotated by itself without rotating thetoroidal core 132, in this case, a driving means rotating the housing310 should be added outside the housing 310.

In addition, a space between the toroidal core 132 and the cover 131spaced apart from each other is utilized as a refrigerant flow route 133that the refrigerant can flow, and a portion of the cover 131 disposedwithin the housing 310 connects a refrigerant intake pipe 138 and arefrigerant outtake pipe 139 for flowing the refrigerant into therefrigerant flow route 133.

The O-ring 330 is formed to vacuum-seal a boundary between the housing310 and the chamber lid 110 a to combine the toroidal core module 300with the chamber lid 110 as shown in FIGS. 8A and 8B.

In addition, a matching circuit 150 in the toroidal core module 300plays a role matching impedance between the induction coil 134 and thepower supply unit 140 a, a V-I probe unit 170 checks voltage and currentof the RF power between the induction coil 134 and the matching circuit150 to accurately control the intensity of the RF power, and therotation driving unit 190, which consists of a motor and a gear,controls a direction of the toroidal core 132. In addition, the toroidalcore module 300 further includes a phase shift circuit (not shown) forphase control. Properly, the power supply unit 140 a, the matchingcircuit 150, the V-I probe unit 170, the rotation driving unit 190 andthe phase shift circuit (not shown) or the like are controlled by thefeedback control unit 160. That is, the feedback control unit 160controls the intensity of the RF power by controlling the power supplyunit 140 a and the matching unit 150 based on the plasma parameterinformation in the chamber 110 inputted from the plasma inspecting unit180 outside toroidal core module 300. The phase of the RF power iscontrolled by controlling the phase shift circuit (not shown), therebyaccurately controlling the plasma parameter and uniformity in thechamber by controlling a direction of the toroidal core 132 and drivingthe rotation driving unit 190.

As shown in FIG. 8A, a feedback control unit 160 a in the housing 130 isformed to perform the control actions, at this time, an apparatusoperator can operate an initial process condition through the controlcomputer 400 by connecting the feedback control unit 160 and an externalcontrol computer 400 using a communication cable.

As shown in FIG. 8B, the feedback control unit 160 is formed outside thehousing 310 so that the toroidal core module 300 could be control usingthe plasma parameter and uniformity information provided from the plasmainspecting unit 180. At this time, the feedback control unit 160 may beformed as a portion of the control computer 400 or as a differentelement from the control computer 400.

Since the external feedback control unit 160 is connected to the powersupply unit 140 a, the matching circuit 150, the V-I probe unit 170 andthe rotation driving unit 190 in the module, this structure has anadvantage capable of controlling more than two modules as a whole. Atthis time, the plasma parameter can be accurately controlled byautomatically controlling the phase shifter 200 connected to each powersupply unit 140 a through the feedback control unit 160.

FIG. 9 is a schematic cross-sectional view showing a plasma generationapparatus having two toroidal core modules according to anotherembodiment of the present invention.

As shown in FIG. 9, although two toroidal core modules 300 are connectedto the feedback control unit 160, the number of the toroidal core module300 is not limited. To obtain uniformity of the plasma considering alarge-sized substrate, the toroidal core module 300 should have muchgreater the number thereof. Here, when the toroidal core module 300 isformed as a plurality of elements, it may be formed with series orparallel.

According to the present invention, by disposing the opening portion ofthe toroidal core, which the induction electric field is combined withthe toroidal core as a plasma source, within the chamber, energytransmission efficiency increases, thereby generating plasma having ahigh density and high electron energy. Further, plasma burning can beeasily performed. In addition, the induction coil applying the RF powerto the toroidal core combines with the toroidal core outside thechamber, vacuum sealing the power supply line and the cooling line donot have to any more, thereby raising cooling efficiency of the toroidalcore.

Furthermore, since the induction electric field is formed in parallelwith the substrate, the substrate defect by the ion bombardment can beeffectively reduced.

Yet, in addition, the toroidal core, the induction coil, the RF powersupply, the matching circuit, the rotation driving unit and the feedbackcontrol unit or the like are manufactured as one module, and the numberof the module, the direction, and phase of the electric field or thelike can be controlled, thereby easily obtaining uniformity of theprocess in a large-sized substrate.

It will be apparent to those skilled in the art that variousmodifications and variations can be made in the fabrication andapplication of the present invention without departing from the spiritor scope of the invention. Thus, it is intended that the presentinvention cover the modifications and variations of this inventionprovided they come within the scope of the appended claims and theirequivalents.

1. A plasma generation apparatus, comprising: a chamber having a chamberlid and defining an airtight reaction region for generating a plasma; asusceptor in the chamber; a gas supply means supplying a process gas tothe chamber; and a toroidal core vertically disposed with respect to thesusceptor through the chamber lid, comprising: a toroidal ferromagneticcore combined with the chamber, the toroidal ferromagnetic core having afirst portion outside the chamber and a second portion inside thechamber, the second portion having an opening portion; a radio frequency(RF) power supply connected to the chamber; a phase shifter connected tothe RF power supply; an induction coil electrically connected to the RFpower supply, the induction coil rolling the first portion; and amatching circuit matching an impedance between the RF power supply andthe induction coil, wherein the plasma generation apparatus has at leasetwo toroidal ferromagnetic cores and the RF power supply independentlycorresponding to each of the at least two toroidal ferromagnetic cores.2. The apparatus according to claim 1, wherein the toroidalferromagnetic core includes one of a ferrite material and an iron powdermaterial.
 3. The apparatus according to claim 1, further comprising acover covering the toroidal ferromagnetic core.
 4. The apparatusaccording to claim 3, wherein the cover includes one of ceramic,aluminum and stainless steel.
 5. The apparatus according to claim 1,wherein the toroidal ferromagnetic core has a central axis parallel witha surface of the susceptor.
 6. The apparatus according to claim 1,wherein the plasma generation apparatus has at least two toroidalferromagnetic cores and the RF power supply, and wherein each of the atleast two toroidal ferromagnetic cores connected to the RF power supply.7. The apparatus according to claim 1, wherein the RF power supplysupplies a RF power having a range within about 10 KHz to about 13.56MHz.
 8. The apparatus according to claim 1, further comprising: aplasma-inspecting unit measuring a plasma parameter in the chamber; afeedback control unit controlling one of the RF power supply and thematching circuit according to an information of the plasma parameter tocontrol a RF power transmitted to the toroidal ferromagnetic core. 9.The apparatus according to claim 8, further comprising a voltage-current(V-I) probe unit supplying the information of the plasma parameter tothe feedback control unit by measuring a voltage and a current in aconducting wire between the matching circuit and the induction coil. 10.The apparatus according to claim 8, further comprising a rotationdriving unit rotating the toroidal ferromagnetic core with apredetermined angle and controlled by the feedback control unit.
 11. Aplasma generation apparatus, comprising: a chamber having a chamber lidand defining an airtight reaction region for generating a plasma; asusceptor in the chamber; a gas supply means supplying a process gas tothe chamber; a plasma-inspecting unit measuring a plasma parameter inthe chamber; a feedback control unit controlling one of the power supplyunit and the matching circuit according to information of the plasmaparameter; and a toroidal core module including a toroidal corevertically disposed with respect to the susceptor through the chamberlid, the toroidal core combined with the chamber, the toroidal corehaving a first portion outside the chamber and a second portion insidethe chamber, the second portion having an opening portion, comprising: apower supply unit generating a radio frequency (RF) power by beconnected to an external power supply; an induction coil electricallyconnected to the power supply unit, the induction coil rolling thetoroidal core; a matching circuit matching an impedance between thepower supply unit and the induction coil; a housing surrounding thetoroidal core, the power supply unit, the induction coil and thematching circuit; and a rotation driving unit rotating the toroidal corewith a predetermined angle and controlled by the feedback control unitin the housing.
 12. The apparatus according to claim 11, furthercomprising a cover covering the toroidal core.
 13. The apparatusaccording to claim 11, wherein the toroidal core includes one of aferrite material and an iron powder material.
 14. The apparatusaccording to claim 11, wherein the RF power has a range within about 10KHz to about 13.56 MHz.
 15. The apparatus according to claim 11, furthercomprising a voltage-current (V-I) probe unit supplying the informationof the plasma parameter to the feedback control unit by measuring avoltage and a current of a conducting wire connecting the matchingcircuit and the induction coil in the housing.
 16. The apparatusaccording to claim 11, further comprising a phase shifter connected tothe power supply unit, the phase shifter controlling a phase of the RFpower and controlled by the feedback control unit.
 17. The apparatusaccording to claim 11, wherein the plasma generation apparatus includesat least two toroidal core modules.
 18. The apparatus according to claim17, wherein the toroidal core is an antenna for generating the plasmawithin the chamber.